12-14 May 2004 - Hôtel Eden au Lac - Montreux, Switzerland.
Invited Talks


  Super-fine inkjet printing -toward the minimal manufactuaring system-
K. Murata, National Institute of Advanced Industrial Science and Technology Nanotechnology Research Institute, Ibaraki, Japan.

A super-fine inkjet system which allows arrangements of dots with a minimum size of less than one micron has been developed. We will show the possibility toward the minimal manufacturing system.


  SOI gas sensing microsystems
F. Udrea, Cambridge University, UK.

The development of solid state gas sensors and their gradual transition to smart CMOS technology will be reviewed, followed by a detailed discussion of advantages/disadvantages of using SOI micromachning technology compared to standard bulk technology.
New concepts in SOI microsystems such as use of CMOS compatible layers for micro-hotplates will also be described. The presentation will end with a discussion on the use of smart gas sensors in high volume wireless applications.


  RF MEMSoC
G. K. Fedder, Carnegie Mellon University, Pittsburgh, USA.

The demand for low-power embedded wireless capability is driving a trend to make more sophisticated and better performing RF systems on chip.
Advances in CMOS and BiCMOS micromachining has led to recent work on MEMS-enabled RF circuits that exploit on-chip passives with superior quality factor and tuning capabilities.


  Quartz Challenged by Silicon Micromechanics
T. Mattila, VTT Information Technology, Espoo, Finland.

Despite the ongoing digitalization, an analog frequency reference is required in every wireless transceiver for the foreseeable future. The conventional solution relies on quartz crystals that appear bulky in the otherwise highly integrated architectures. The presentation will describe the recent advances in the silicon microresonator technology - in particular, how the short- and long-term frequency stability can be realized in the miniature size.

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